(Answered) An implanted profile is formed by two boron implantations

Engineering

An implanted profile is formed by two boron implantations. The first one uses energy of 100 k_eV and the second one, an energy of 200 k_eV. The peak concentration of each distribution is 5 x 1018 /cm³.

Draw a graph of the composite profile and find the junction depth(s) if the phosphorus background concentration is 10 1 6 /cm³. What are the doses of the two implant steps?

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