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A single atomic layer of oxygen atoms (~5x1014 atomscm-2) collects on the surface of a 1 cm2 wafer of silicon. The silicon is thenmelted and all of the oxygen dissolves in it. Upon cooling silicon freezes into a singlecrystal again. Assuming a uniform final oxygen concentration in the silicon of 0.1parts per million, how thick would the original silicon wafer have to havebeen?

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