In a particular application, it is important to produce a fairly flat profile over an ex-tended distance by ion implantation, as indicated below.
One way to do this is to superimpose several implants at different energies.
If phosphorus implants with energies of 0.5 Rp, Rp, 2Rp are used with a dose of 1 X 1014 cm-2 in the middle peak, approximately what doses should be used in the adjacent peaks if the initial peak concentrations are to be the same?
